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¯Ç¦ÌÀ£¦L§Þ³NNIL(NanoImprint Lithography technology¡^Ãþ¦ü©ó¥j¥Nªº¦L³¹¡A¬O¤@¶µ¹Ï§ÎÂಾ©M´_¨î§Þ³N¡C1995¦~¡A´¶ªL´µ¹y¤j¾Ç¯Ç¦Ìµ²ºc¹êÅç«ÇStephen Y.Chou±Ð±Â³q¹L¾÷±ñ¤O¦bÒ\¦³°ª¤À¤l§÷®ÆªºÖº°òªO¤ñ¨ÒÀ£¦L´_¨î¤F¼Òª©¤Wªº¯Ç¦Ì¹Ï®×¡A¨ä¥[¤u¤À¿ë²v¥u»P¼Òª©¹Ï®×¤Ø¤o¦³Ãö¡A¦Ó¤£¨ü¥ú¨èµuÃn¥úªiªøªºª«²z­­¨î¡A¥Ñ¦¹¤Þ¥X¯Ç¦ÌÀ£¦L§Þ³N¡C


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     ¶Ç²Î¥ú¨è§Þ³N¬O§Q¥Î¹q¤l©M¥ú¤l§ïÅÜ¥ú¨è½¦ªºª«²z¤Æ¾Ç©Ê½è¡A¶i¦Ó±o¨ì¬ÛÀ³ªº¯Ç¦Ì¹Ï§Î¡CNIL§Þ³N«o¥i¥H¤£¨Ï¥Î¹q¤l©M¥ú¤l¡Aª½±µ§Q¥Îª«²z¾÷²z¾÷±ñ¦a¦b¥ú¨è½¦¤Wºc³y¯Ç¦Ì¤Ø¤o¹Ï§Î¡C¥Ø«eNIL§Þ³N¤w¸g¥i¥H¨î§@½u¼e¦b5nm¥H¤Uªº¹Ï®×¡Cų©ó¨ä§Þ³NÀu¶Õ¡ANIL¥iÀ³¥Î©ó·L¹q¤l¾¹¥ó¡B«H®§¦sÀx¾¹¥ó¡B·L¤ÏÀ³¾¹¡B·L/¯Ç¾÷¹q«Y²Î¡B¶Ç·P¾¹¡B·L/¯Ç¬y±±¾¹¥ó¡B¥Íª«Âå¥Î¬É­±¡B¥ú¾Ç¤Î¥ú¤l¾Ç§÷®Æµ¥²³¦h»â°ì¡C




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The EITRE? Nano Imprint Lithography (NIL) Systems offer a manual and affordable lithography solution, allowing pattern replication in the micro- and nanometer range. The embedded SoftPress? technology ensures excellent residual layer thickness control across the entire imprint area, enabling an accurate pattern transfer.




FULL AREA IMPRINT

 SOFTPRESS? TECHNOLOGY

 USER-FRIENDLY INTERFACE

 MULTIPLE IMPRINT PROCESS CAPABILITY

 WIDE RANGE OF CONFIGURATION POSSIBILITIES

SUB-20NM RESIDUAL LAYER THICKNESS



   



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