ULVAC DA-121DE隔膜真空泵可議價
ULVAC DA-121DE隔膜真空泵可議價
ULVAC DA-121DE隔膜真空泵可議價
ULVAC DA-121DE隔膜真空泵產品特性
ULVAC DA-121DE隔膜真空泵應用領域
ULVAC DA-121DE隔膜真空泵技術規格
ULVAC DA-121DE隔膜真空泵性能參數
ULVAC DA-121DE 隔膜真空泵相關信息
ULVAC DA-121DE 一、基本性能參數
極限壓力：3300(pa)
抽氣速率：7200(l/s)，換算後50赫茲下120升/分鐘、60赫茲下145升/分鐘
功率：0.4(kw)
電壓：有100V、115V、200V、220V等規格，如1φ100V(50/60Hz)
重量：26(kg)
外形尺寸：193.5411285
排出口徑：G1/2(mm)
ULVAC DA-121DE 二、工作原理與結構特點
原理：隔膜泵，是利用薄橡膠膜(隔膜)的往復運動進行真空排氣的真空泵。
結構特點
構造簡單：維保方便，易於維護。
無油環境設計：氣體接觸區域不使用油，屬於幹式真空泵，可避免油污染，適用於對清潔度要求較高的工作環境，如半導體和電子器件制造設備相關的真空排氣係統（刻蝕設備、去膠設備、離子清洗設備等）、真空熱處理爐真空排氣係統（燒結爐、滲碳爐等）、鋰電池制造設備真空排氣係統（電極幹燥設備、脫泡設備、注液設備等）。
ULVAC DA-121DE 三、應用領域
半導體和電子器件制造：在刻蝕設備、去膠設備、離子清洗設備等真空排氣係統中有應用，這些設備在半導體芯片制造過程中對真空環境要求嚴格，DA-121DE隔膜真空泵能滿足其需求，保障生產過程順利進行。
真空熱處理：例如在燒結爐、滲碳爐等真空熱處理爐的真空排氣係統中發揮作用，確保爐內達到所需的真空度，有助於提高熱處理的質量和效果。
鋰電池制造：可應用於電極幹燥設備、脫泡設備、注液設備等鋰電池制造設備的真空排氣係統，為鋰電池生產過程提供穩定的真空環境，有助於提高鋰電池的性能和質量。
ULVAC DA-121DE diaphragm vacuum pump related information
1. Basic performance parameters
Ultimate pressure: 3300(pa)
Pumping rate: 7200 (l/s), converted to 120 liters/minute at 50 Hz and 145 liters/minute at 60 Hz
Power: 0.4(kw)
Voltage: 100V, 115V, 200V, 220V and other specifications, such as 1φ100V (50/60Hz)
Weight: 26(kg)
Overall dimensions: 193.5411285
Discharge diameter: G1/2(mm)
2. Working principle and structural characteristics
Principle: Diaphragm pump is a vacuum pump that uses the reciprocating motion of a thin rubber membrane (diaphragm) to exhaust vacuum.
Structural features
Simple structure: convenient and easy to maintain.
Oil-free environment design: No oil is used in the gas contact area. It is a dry vacuum pump, which can avoid oil pollution. It is suitable for working environments with high requirements for cleanliness, such as vacuum exhaust systems (etching) related to semiconductor and electronic device manufacturing equipment. equipment, degumming equipment, ion cleaning equipment, etc.), vacuum heat treatment furnace vacuum exhaust system (sintering furnace, carburizing furnace, etc.), lithium battery manufacturing equipment vacuum exhaust system (electrode drying equipment, deaeration equipment, liquid injection equipment, etc. ).
3. Application fields
Semiconductor and electronic device manufacturing: It is used in vacuum exhaust systems such as etching equipment, glue removal equipment, and ion cleaning equipment. These equipments have strict vacuum environment requirements during the semiconductor chip manufacturing process. The DA-121DE diaphragm vacuum pump can meet their needs. , to ensure the smooth progress of the production process.
Vacuum heat treatment: For example, it plays a role in the vacuum exhaust system of vacuum heat treatment furnaces such as sintering furnaces and carburizing furnaces to ensure that the required vacuum degree is achieved in the furnace, which helps to improve the quality and effect of heat treatment.
Lithium battery manufacturing: It can be applied to the vacuum exhaust system of lithium battery manufacturing equipment such as electrode drying equipment, deaeration equipment, and liquid injection equipment to provide a stable vacuum environment for the lithium battery production process and help improve the performance and quality of lithium batteries. .
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